发明名称 APPARATUS AND METHOD OF CLEANING ROTARY ATOMIZING HEAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a cleaning technology where there is no risk that a washing liquid scatters to a coating machine body when the outer surface of a rotary atomizing head is cleaned. <P>SOLUTION: In the cleaning apparatus 20 of the rotary atomizing head for cleaning a rear surface 25 of the rotary atomizing head 19, a liquid supply pipe 26 for supplying washing liquid is extended to the rear surface 25 of the rotary atomizing head 19. The liquid supply pipe 26 has a delivery hole (details are described later) for delivering the washing liquid to the rear surface 25 of the rotary atomizing head 19, and the center line 43 of the delivery hole is on the rear surface 25. According to the apparatus, the delivery hole of the washing liquid exists near the rear surface of the rotary atomizing head so that the washing liquid can be delivered without scattering. When the rear surface of the rotary atomizing head is cleaned, there is no worry that the washing liquid scatters to the coating machine body. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011230034(A) 申请公布日期 2011.11.17
申请号 JP20100101295 申请日期 2010.04.26
申请人 HONDA MOTOR CO LTD 发明人 WAKIMOTO TAKASHI;HARIYA YU;SHOJI MASAAKI;NODA SHINJI
分类号 B05B5/04;B05B3/10;B05B5/08;B05D1/04;B05D3/10 主分类号 B05B5/04
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