发明名称 |
PROCESS KIT SHIELD FOR IMPROVED PARTICLE REDUCTION |
摘要 |
Apparatus for improved particle reduction are provided herein. In some embodiments, an apparatus may include a process kit shield comprising a one-piece metal body having an upper portion and a lower portion and having an opening disposed through the one-piece metal body, wherein the upper portion includes an opening-facing surface configured to be disposed about and spaced apart from a target of a physical vapor deposition chamber and wherein the opening-facing surface is configured to limit particle deposition on an upper surface of the upper portion of the one-piece metal body during sputtering of a target material from the target of the physical vapor deposition chamber.
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申请公布号 |
US2011278165(A1) |
申请公布日期 |
2011.11.17 |
申请号 |
US201113106392 |
申请日期 |
2011.05.12 |
申请人 |
RASHEED MUHAMMAD;WANG RONGJUN;LIU ZHENDONG;FU XINYU;TANG XIANMIN;APPLIED MATERIALS, INC. |
发明人 |
RASHEED MUHAMMAD;WANG RONGJUN;LIU ZHENDONG;FU XINYU;TANG XIANMIN |
分类号 |
C23C14/04 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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