| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for efficiently recovering copper and manganese components in a reusable state from a depurative containing copper oxide and manganese oxide used to remove phosphines or gaseous silanes contained in waste gas discharged from a semiconductor producing process or the like. SOLUTION: A depurative containing copper oxide and manganese oxide used to depurate harmful gas containing phosphines or gaseous silanes is immersed in an acidic solution and a precipitate of copper and manganese compounds or a precipitate of phosphorus or silicon compounds is formed. The copper and manganese components are separated from the phosphorus or silicon components and the copper and manganese components of the depurative are recovered.</p> |
