发明名称 |
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
<p>A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has, on an undersurface, a liquid supply opening or a plurality of liquid supply openings and a liquid extraction opening or a plurality of liquid extraction openings arranged such that, in use, liquid is provided on and removed from the undersurface of the fluid handling structure.</p> |
申请公布号 |
NL2006615(A) |
申请公布日期 |
2011.11.14 |
申请号 |
NL20112006615 |
申请日期 |
2011.04.18 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
CORTIE, ROGIER;RIEPEN, MICHEL;CORNELISSEN, ROB |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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