发明名称 PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To prevent, in a plasma processing apparatus, corrosion of a lower end part of an inner electrode in an arrangement of three or more electrodes, which is caused by corrosive components generated from surface discharge. <P>SOLUTION: Three or more plate-shaped electrodes 21 are arranged. A discharge generation surface 27 of each electrode 21 is covered with a dielectric member 30, which consists of a plate-shaped solid dielectric. A purge gas is injected from a purge nozzle 70 provided on the side part of the electrode 21. The purge gas flows along the bottom end faces of inner electrodes 21B, 21C, and 21D. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011228593(A) 申请公布日期 2011.11.10
申请号 JP20100099135 申请日期 2010.04.22
申请人 SEKISUI CHEM CO LTD 发明人 MAYUMI SATOSHI;YASHIRO SUSUMU
分类号 H01L21/3065 主分类号 H01L21/3065
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