| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a magnetron sputtering device for use in the deposition of a film having a predictive thickness distribution with low defect levels. <P>SOLUTION: The position of a ring cathode is offset in relation to a center point of a planetary drive system. An anode 20 or reactive gas source 36 may be located within the inner radius of the ring cathode. Lower defect rates are obtained through the lower power density at a cathode 12 which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask. <P>COPYRIGHT: (C)2012,JPO&INPIT |
