| 摘要 |
Disclosed is a method which enables stable and high-speed deposition of a diamond-like carbon film by plasma CVD using a general-purpose vacuum chamber without needing significant modification of the apparatus. Specifically, the method forms a diamond-like carbon film on a substrate by plasma CVD, in which the diamond-like carbon film is formed by applying a bipolar pulsed direct-current voltage to the substrate, feeding a toluene-containing gas to the chamber, and controlling the total gas pressure in the chamber at 4 Pa or more and 7 Pa or less.
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