发明名称 NEW COMPOUND, ELECTRON-BLOCKING MATERIAL AND FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound suitable for the formation of an electron-blocking layer in a photoelectric conversion element capable of decreasing the increase of dark current and also decreasing the increasing width of the dark current in the case of heat-treating the element. <P>SOLUTION: For example, the compound is expressed by the formula. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011225544(A) 申请公布日期 2011.11.10
申请号 JP20110068257 申请日期 2011.03.25
申请人 FUJIFILM CORP 发明人
分类号 C07D209/86;C07D219/14;C07D223/26;C07D265/38;C07D279/36;C07D401/14;C07D403/14;C07D405/14;C07F7/10;H01L31/10;H01L51/42 主分类号 C07D209/86
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