发明名称 Photosensitive composition and pattern forming method using the same
摘要 <p>A photosensitive composition contains: a compound capable of generating an acid upon irradiation with actinic rays or radiation; a basic compound represented by the formula (I-a) as defined herein; a basic compound represented by the formula (I-b) as defined herein; and a surfactant represented by the formula (II) as defined herein.</p>
申请公布号 EP1906238(B1) 申请公布日期 2011.11.09
申请号 EP20070017721 申请日期 2007.09.11
申请人 FUJIFILM CORPORATION 发明人 TSUBAKI, HIDEAKI
分类号 G03F7/004;G03F7/038;G03F7/039 主分类号 G03F7/004
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