发明名称 NON VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A non volatile memory device and a method for manufacturing the same are provided to reduce an area required for a drain selection line by simplifying an electrode wiring process. CONSTITUTION: In a non volatile memory device and a method for manufacturing the same, a bit line(112) is connected to each active layer of the bit line connection. The bit line is connected to each active layer through a bit line plug(111). The bit line vertically is crossed with the word line(11). The bit line is formed in upper part of a string layer(103). One bit line is connected to all strings(103A) which are identical. The drain select line is connected to a plug(109) which is arranged in vertical direction.
申请公布号 KR20110121332(A) 申请公布日期 2011.11.07
申请号 KR20100040884 申请日期 2010.04.30
申请人 HYNIX SEMICONDUCTOR INC.;IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 KIM, SUK GOO;LEE, SEUNG BECK;LEE, JUN HYUK;OH, SEUL KI
分类号 G11C16/24;H01L21/8247 主分类号 G11C16/24
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