A METHOD OF FABRICATING NANO-SCALED STRUCTURE WITH NON-UNIFORM ROUGHNESS

摘要

PURPOSE: A method for manufacturing a nano-scale structure is provided to prevent the damage of a substrate while non-uniform roughness is generated on the nano-scale structure based on impurities introduced in a polycrystalline silicon structure forming process. CONSTITUTION: A method for manufacturing a nano-scale structure includes the following: An oxide layer(20) is formed on the surface of a substrate(10). A polycrystalline silicon structure(11) is formed on the upper side of the oxide layer by introducing impurities. Non-uniform roughness(13) is formed on the polycrystalline silicon structure through an etching process. The substrate is a silicon wafer. The etching process is based on XeF_2. The impurities are nitrogen gas.