METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING EXPOSURE MASK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a glass substrate for a mask blank which suppresses the generation of a minute convex surface defect on the surface of the substrate even if the mirror polishing of the glass substrate is performed by using silica.

SOLUTION: In the method for manufacturing the glass substrate for the mask blank which has a polishing process for polishing the main surface of the glass substrate 1 by relatively moving a polishing part 7 and the glass substrate 1 while supplying a slurry-containing silica, a temperature of the slurry supplied to the glass substrate is controlled at ≤25°C.

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