发明名称 METHOD FOR MANUFACTURING GAS BARRIER FILM AND GAS BARRIER FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing gas barrier film capable of preventing functional groups positioned on the surface of a substrate from being amidated or nitrided and capable of improving the interlayer adhesive force without depending on oxygen bonds and to provide the gas barrier film manufactured by using the method for manufacturing gas barrier film. <P>SOLUTION: The method for manufacturing gas barrier film includes: a plasma treatment step of performing plasma treatment onto the surface of a plastic film that roles as the substrate beforehand in such an environment that an atmospheric pressure is 1&times;10<SP POS="POST">-1</SP>to 1&times;10<SP POS="POST">-3</SP>torr under the introduction of an inactive gas; and a gas barrier layer lamination step of laminating the gas barrier layer having a gas barrier property on the surface of the plastic film after having performed the plasma treatment step. The gas barrier film obtained by the method is also provided. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011218786(A) 申请公布日期 2011.11.04
申请号 JP20110022614 申请日期 2011.02.04
申请人 OIKE IND CO LTD 发明人 YOSHIDA YUJI;KOBAYASHI MEGUMI
分类号 B32B9/00;B32B27/00;B65D65/40;C23C14/02;C23C14/10;C23C16/02;C23C16/42 主分类号 B32B9/00
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