| 摘要 |
The present invention provides a wafer tray for a CVD device, heating unit for a CVD device provided with the wafer tray for a CVD device, and a CVD device provided with the wafer tray for a CVD device that includes a wafer tray main body provided with cavities enabling mounting of a wafer on a first surface, and a connection portion formed to project towards a second surface of the wafer tray main body. A connection indented portion is provided in the connection portion to enable detachable connection to the rotation shaft that enables rotation of the wafer tray main body.
|
