发明名称 |
METAL MASK FOR VAPOR DEPOSITION AND APPARATUS THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask for vapor deposition, which stabilizes sagging of a substrate due to own weight and facilitates the mask to adhere to the substrate using the sagging.SOLUTION: The metal mask 1 for vapor deposition includes: a metal frame 10; and a metal foil 12 which is fixed to the frame 10 and has a plurality of openings 11. The mask provides a substrate receiver 13 at a corner of an inner edge of the frame 10 and is characterized in that the substrate 20 is supported only by the receiver 13. |
申请公布号 |
JP2011214051(A) |
申请公布日期 |
2011.10.27 |
申请号 |
JP20100082034 |
申请日期 |
2010.03.31 |
申请人 |
CANON INC |
发明人 |
MASUDA MASAMICHI;YOSHIDA MASANORI;OYAMA JUNJI;KOGANEI AKIO;MIYAMACHI NAOTOSHI;YAMAGUCHI HIROTO;NAKAGAWA YOSHIYUKI;KARAKI TETSUYA;UKIGAYA NOBUTAKA;YOSHIKAWA TOSHIAKI |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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