发明名称 METAL MASK FOR VAPOR DEPOSITION AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a metal mask for vapor deposition, which stabilizes sagging of a substrate due to own weight and facilitates the mask to adhere to the substrate using the sagging.SOLUTION: The metal mask 1 for vapor deposition includes: a metal frame 10; and a metal foil 12 which is fixed to the frame 10 and has a plurality of openings 11. The mask provides a substrate receiver 13 at a corner of an inner edge of the frame 10 and is characterized in that the substrate 20 is supported only by the receiver 13.
申请公布号 JP2011214051(A) 申请公布日期 2011.10.27
申请号 JP20100082034 申请日期 2010.03.31
申请人 CANON INC 发明人 MASUDA MASAMICHI;YOSHIDA MASANORI;OYAMA JUNJI;KOGANEI AKIO;MIYAMACHI NAOTOSHI;YAMAGUCHI HIROTO;NAKAGAWA YOSHIYUKI;KARAKI TETSUYA;UKIGAYA NOBUTAKA;YOSHIKAWA TOSHIAKI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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