发明名称 |
PLASMA ACTIVATED CONFORMAL FILM DEPOSITION |
摘要 |
Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
|
申请公布号 |
US2011256726(A1) |
申请公布日期 |
2011.10.20 |
申请号 |
US201113084399 |
申请日期 |
2011.04.11 |
申请人 |
LAVOIE ADRIEN;SWAMINATHAN SHANKAR;KANG HU;CHANDRASEKHARAN RAMESH;DORSH TOM;HAUSMANN DENNIS M;HENRI JON;JEWELL THOMAS;LI MING;SCHLIEF BRYAN;XAVIER ANTONIO;MOUNTSIER THOMAS W;VAN SCHRAVENDIJK BART J;SRINIVASAN EASWAR;SRIRAM MANDYAM |
发明人 |
LAVOIE ADRIEN;SWAMINATHAN SHANKAR;KANG HU;CHANDRASEKHARAN RAMESH;DORSH TOM;HAUSMANN DENNIS M.;HENRI JON;JEWELL THOMAS;LI MING;SCHLIEF BRYAN;XAVIER ANTONIO;MOUNTSIER THOMAS W.;VAN SCHRAVENDIJK BART J.;SRINIVASAN EASWAR;SRIRAM MANDYAM |
分类号 |
H01L21/311;B05C5/00;B32B38/08;C23F1/02;H01L21/306;H01L21/31 |
主分类号 |
H01L21/311 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|