| 摘要 |
PROBLEM TO BE SOLVED: To effectively suppress exposure irregularities caused by high and low levels of a lid that plugs the opening of a chuck.SOLUTION: The chuck is provided with at least one opening, a lid 14 that plugs the opening, and a height adjusting mechanism that adjusts the mounting height of the lid 14 from the chuck. A non-vacuum compartment is formed in the circumference of the opening of the chuck, an air passage that leads to the rear surface of the chuck from the non-vacuum compartment is arranged, and a vacuum compartment is formed in the circumference of the non-vacuum compartment. Using the height adjusting mechanism, the height from the installed lid 14 to the chuck is adjusted. The height of the upper surface of the lid 14 is made lower than the height of the upper surface of the chuck, a substrate is vacuum-adsorbed by the vacuum compartment. Then, the substrate is fixed to the chuck, and the non-vacuum compartment opens to atmosphere through the air passage, thereby preventing the substrate from being adsorbed by the non-vacuum compartment. |
