| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having favorable lithographic characteristics and dispersibility in a solvent, and suppressing a residue or blushing after development.SOLUTION: The photosensitive resin composition contains a polyimide resin, a photosensitive agent, a carboxyl group-containing triazole compound expressed by formula (1), at least one organic solvent selected from a group consisting of an amide solvent that dissolves the carboxyl group-containing triazole compound, a lactone solvent and a 1-10C alcohol solvent having at least two alcoholic hydroxyl groups in the molecule. In formula (1), Rand Reach represent a 1-20C organic group and may be identical or different from each other; and n represents an integer of 1 to 4. |
