发明名称 MULTILAYER THREE-DIMENSIONAL CIRCUIT STRUCTURE
摘要 A multilayer three-dimensional circuit structure and a manufacturing method thereof are provided in the present invention. The manufacturing method includes following steps. First, a three-dimensional insulating structure is provided. A first three-dimensional circuit structure is then formed on a surface of the three-dimensional insulating structure. Next, an insulating layer covering the first three-dimensional circuit structure is formed. Thereafter, a second three-dimensional circuit structure is formed on the insulating layer. Subsequently, at least a conductive via penetrating the insulating layer is formed for electrically connecting the second three-dimensional circuit structure and the first three-dimensional circuit structure.
申请公布号 US2011253435(A1) 申请公布日期 2011.10.20
申请号 US201113166133 申请日期 2011.06.22
申请人 UNIMICRON TECHNOLOGY CORP. 发明人 HUANG HAN-PEI;YU CHENG-HUNG
分类号 H05K1/03;H05K1/11 主分类号 H05K1/03
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