PHOTORESIST FILM AND METHODS FOR ABRASIVE ETCHING AND CUTTING
摘要
<p>A photoresist film and method of using the photoresist film is described. The photoresist film allows for fine-detail abrasive blasting of substrates without the use of organic solvents for development. The photoresist film can be formed without the use of a membrane or adhesive layer, both of which are typically used to secure one side of the photoresist film to a carrier and one side of the photoresist film to a substrate. The photoresist films of the present invention typically include an ethylene-vinyl acetate copolymer ("EVA"), a polyvinyl acetate ("PVAc"), and a photo polymer. Suitable photopolymers include polyvinyl alcohol photopolymers.</p>
申请公布号
WO2011130300(A1)
申请公布日期
2011.10.20
申请号
WO2011US32154
申请日期
2011.04.12
申请人
IKONICS CORPORATION;MENOR, DANIEL, B.;LIBERI, VINCENT, E.