| 摘要 |
<p>Method and apparatus for removing residues of hazardous materials from vapour in a tank (1), wherein such a vapour is heated, passed outside the tank and subsequently cooled and the remaining dry vapour is recirculated, characterized in that a) said vapour is heated to a temperature of at least 5°C above the melting point and below the self ignition point of the hazardous material, b) the vapour mixture thus formed is passed by means of a pump (3) from the tank through a discharge unit to a recovery unit, c) is cooled to a temperature of at least 5°C lower and above the melting point of the hazardous material in a recovery unit, d) the liquid components of the vapour are recovered and the dry gas mixture is recirculated to the tank after reheating to the desired temperature, e) said recirculation being repeated as required.</p> |
