发明名称 FLANGE FOR A CVD REACTOR HOUSING, USE OF A CAMERA IN A CVD METHOD, AND CVD METHOD FOR PRODUCING SILICON RODS
摘要 The invention relates to a flange (4) for a CVD reactor (1) to which a camera, particularly a thermal imaging camera (10), has been attached by means of a fastening device (5), wherein the camera may be oriented such that at least one of the silicon rods (15) located in the CVD reactor (1) is captured. The invention further relates to a use of a camera, particularly a thermal imaging camera (10), for determining the diameter D of silicon rods (15) during the deposition process of pure silicon when conducting a CVD method. In addition, the invention relates to a CVD method for producing silicon rods (15) wherein the fluid volume of the process gas supplied is a function of the diameter D of the silicon rods (15).
申请公布号 WO2011015330(A3) 申请公布日期 2011.10.13
申请号 WO2010EP04720 申请日期 2010.08.02
申请人 GRAEBER ENGINEERING CONSULTANTS GMBH;KIENZLER, RALPH 发明人 KIENZLER, RALPH
分类号 G01N21/01;B01J3/00;C01B33/035;C23C16/24;C23C16/52;G01B11/00;G01B11/06;G01B11/08;G01B21/08;H01L21/66 主分类号 G01N21/01
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