| 摘要 |
PROBLEM TO BE SOLVED: To reduce a quantity of pure water required for washing, and make an apparatus compact so as to reduce the footprint occupied thereby, in the apparatus for washing a substrate such as a disk.SOLUTION: In a washing apparatus including: a scrub washing unit for washing both surfaces of a substrate, which are scrubbed by a rotating brush while supplying pure water to both surfaces of the substrate; a rinse unit for washing the surfaces of the substrate which have been washed by the scrub washing unit using the pure water; and a dry unit for drying the surfaces of the substrate which have been washed by the rinse unit, the scrub washing unit includes an ultrasonic application unit for applying ultrasonic waves to pure water supplied to the both surfaces of the substrate, which are scrubbed and washed by the rotating brush while supplying the pure water to which the ultrasonic wave has been applied by the ultrasonic application unit to the both surfaces of the substrate. |
