发明名称 VIA STRUCTURE OF A SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 Semiconductor devices, such as GaN HEMT and HFET devices, and methods of forming such devices, with a via that provides an electrical connection between a contact and a corresponding external contact pad. Embodiments include semiconductor devices with a via extending through a dielectric material to connect a gate to a corresponding external contact pad, and semiconductor devices with a via extending through a dielectric material to connect an Ohmic contact and a corresponding external contact pad. Embodiments also include semiconductor devices with a via connecting an external contact pad to a gate that is formed above a dielectric material.
申请公布号 US2011248283(A1) 申请公布日期 2011.10.13
申请号 US201113081140 申请日期 2011.04.06
申请人 发明人 CAO JIANJUN;BEACH ROBERT;LIDOW ALEXANDER;NAKATA ALANA
分类号 H01L29/20;H01L21/28 主分类号 H01L29/20
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