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发明名称
METHOD OF FORMING HIGH DENSITY STRUCTURES AND LOW DENSITY STRUCTURES WITH A SINGLE PHOTOMASK
摘要
申请公布号
EP2118928(B1)
申请公布日期
2011.10.12
申请号
EP20080725624
申请日期
2008.02.15
申请人
MICRON TECHNOLOGY, INC.
发明人
ALAPATI, RAMAKANTH;NIROOMAND, ARDAVAN;SANDHU, GURTEJ, S.
分类号
H01L21/8247
主分类号
H01L21/8247
代理机构
代理人
主权项
地址
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