| 摘要 |
<p>A photosensitive composition comprises (A) a sulfonium or iodonium salt having an anion represented by one of formulae (I) and (II):
wherein Y represents an alkylene group substituted with at least one fluorine atom, and
R represents an alkyl group or a cycloalkyl group.
the photosensitive composition further comprising:
(D) a resin soluble in an alkali developer; and
(E) an acid crosslinking agent that crosslinks with the resin (D).</p> |
