发明名称 Bonding structure and fabrication thereof
摘要 A bonding structure and the method of fabricating the same are disclosed. The bonding structure of the invention includes a copper-based pad formed in an insulator layer and a protection layer substantially covering top surface of the copper-based pad. The protection layer is self-aligned formed and the material thereof is selected from a group consisting of metal nitride, copper alloy, copper compounds, and a combination thereof.
申请公布号 US8034711(B2) 申请公布日期 2011.10.11
申请号 US20070964195 申请日期 2007.12.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 YU CHEN-HUA;TSENG HORNG-HUEI
分类号 H01L21/4763;H01L23/48 主分类号 H01L21/4763
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