发明名称 Thin-film transistor substrate having oxide active layer patterns and method of fabricating the same
摘要 A thin-film transistor (TFT) substrate has improved electrical properties and reduced appearance defects and a method of fabricating the TFT substrate, are provided. The TFT substrate includes: gate wiring which is formed on a surface of an insulating substrate; oxide active layer patterns which are formed on the gate wiring and include an oxide of a first material; buffer layer patterns which are disposed on the oxide active layer patterns to directly contact the oxide active layer patterns and include a second material; and data wiring which is formed on the buffer layer patterns to insulatedly cross the gate wiring, wherein a Gibbs free energy of the oxide of the first material is lower than a Gibbs free energy of an oxide of the second material.
申请公布号 US8035110(B2) 申请公布日期 2011.10.11
申请号 US20090498816 申请日期 2009.07.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DO-HYUN;YUN PIL-SANG;KIM KI-WON;LEE DONG-HOON;JEONG CHANG-OH
分类号 H01L29/04 主分类号 H01L29/04
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