发明名称 Method of manufacturing a trench MOSFET having trench contacts integrated with trench Schottky rectifiers having planar contacts
摘要 An integrated configuration comprising trench MOSFET having trench contacts and trench Schottky rectifier having planar contacts is disclosed. The trench contacts for trench MOSFET provide a lower specific on-resistance. Besides, for trench gate connection, planar gate contact is employed in the present invention to avoid shortage issue between gate and drain in shallow trench gate. Besides, W plugs filled into both trench contacts and planar contacts enhance the metal step coverage capability.
申请公布号 US8034686(B2) 申请公布日期 2011.10.11
申请号 US20100838707 申请日期 2010.07.19
申请人 FORCE MOS TECHNOLOGY CO., LTD. 发明人 HSIEH FU-YUAN
分类号 H01L21/336 主分类号 H01L21/336
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