发明名称 Metal-polishing liquid and chemical-mechanical polishing method using the same
摘要 A metal-polishing liquid includes colloidal silica and a compound represented by Formula (I) or a compound represented by Formula (II). The colloidal silica is substituted by aluminum atoms at least one portion of the silicon atoms on the surfaces thereof. In Formula (I), R1 represents an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; R2 represents hydrogen atom, an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; m represents an integer from 0 to 6. In Formula (II), R3 represents an alkyl group or aryl group; n represents an integer from 1 to 30. R1—OOC—(CH2)m—COO—R2  Formula (I) R3—O—(CH2CH2O)n—SO3H  Formula (II)
申请公布号 US8034252(B2) 申请公布日期 2011.10.11
申请号 US20070701403 申请日期 2007.02.02
申请人 FUJIFILM CORPORATION 发明人 YAMASHITA KATSUHIRO
分类号 H01L21/461;B24B37/00;C09K3/14;H01L21/304 主分类号 H01L21/461
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