| 摘要 |
<p>Disclosed is an electromagnetic wave shielding film, which has a high light transmission rate in the visible wavelength region, high electromagnetic wave shielding performance, and a small film stress. The electromagnetic wave shielding film (3) is formed by alternately laminating a plurality of high refractive index films (3H), each of which has a relatively high refractive index, and a plurality of low refractive index films (3L), each of which has a relatively low refractive index. The high refractive index films (3H) include a plurality of ITO films. The electromagnetic wave shielding film (3) does not have a metal film. When the thickness of the whole electromagnetic wave shielding film (3) is t0, and the total thickness of the ITO films is t1, the ratio of t1/t0 is 0.3 or more.</p> |
