发明名称 METAL MASK AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a metal mask effective for forming a sputtering film having a thick film thickness achieving high capacity when a foil-shaped porous valve metal anodic body suitable as an anodic body of a thin type solid electrolytic capacitor is manufactured.SOLUTION: The sputtering metal mask is a plate material made of metal which includes penetrated aperture parts having nearly rectangular and similar aperture shapes and which has an overhanging part formed by a wall of the aperture part at an end of the aperture part of a plane having the aperture shape having the smaller similitude ratio, wherein a plane having the aperture shape having the larger similitude ratio is on the side in contact with a material to be sputtered.
申请公布号 JP2011195876(A) 申请公布日期 2011.10.06
申请号 JP20100063296 申请日期 2010.03.18
申请人 SUMITOMO METAL MINING CO LTD 发明人 ANDO ISAO;KOMUKAI TETSUSHI;TAKITA YUKA
分类号 C23C14/04;H01G13/00 主分类号 C23C14/04
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