发明名称 |
METAL MASK AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask effective for forming a sputtering film having a thick film thickness achieving high capacity when a foil-shaped porous valve metal anodic body suitable as an anodic body of a thin type solid electrolytic capacitor is manufactured.SOLUTION: The sputtering metal mask is a plate material made of metal which includes penetrated aperture parts having nearly rectangular and similar aperture shapes and which has an overhanging part formed by a wall of the aperture part at an end of the aperture part of a plane having the aperture shape having the smaller similitude ratio, wherein a plane having the aperture shape having the larger similitude ratio is on the side in contact with a material to be sputtered. |
申请公布号 |
JP2011195876(A) |
申请公布日期 |
2011.10.06 |
申请号 |
JP20100063296 |
申请日期 |
2010.03.18 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
ANDO ISAO;KOMUKAI TETSUSHI;TAKITA YUKA |
分类号 |
C23C14/04;H01G13/00 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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