| 摘要 |
An intervertebral implant device, including: a pair of substantially parallel opposed arcuate surfaces; a pair of substantially parallel opposed frictional surfaces each including a plurality of raised structures; a substantially curved end wall joining the pair of parallel opposed arcuate surfaces; and a substantially recessed end wall joining the pair of parallel opposed arcuate surfaces; wherein the intervertebral implant device defines one or more voids in which a bone graft material is selectively disposed. Preferably, the substantially recessed end wall is configured to selectively and pivotably receive one or more surgical implantation devices. |
