| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for forming an insulative light-shielding film for use in forming the insulative light-shielding film around an effective pixel region (imaging area) of a solid-state imaging element such as a CCD and a CMOS, and also to provide a method of forming the insulative light-shielding film, the insulative light-shielding film, and the solid-state imaging element.SOLUTION: The radiation-sensitive composition for forming an insulative light-shielding film for use in forming a light-shielding insulation area on the solid-state imaging element contains titanium black and a solvent. |
