发明名称 METHOD AND APPARATUS FOR IMPROVED WAFER SINGULATION
摘要 Laser singulation of electronic devices 12 from semiconductor substrates including wafers 180 is performed using up to 3 lasers 150, 160, 170 from 2 wavelength ranges. Using up to 3 lasers 150, 160, 170 from 2 wavelength ranges permits laser singulation of wafers 180 held by die attach film 184 while avoiding problems caused by single-wavelength dicing. In particular, using up to 3 lasers 150, 160, 170 from 2 wavelength ranges permits efficient dicing of semiconductor wafers 180 while avoiding debris and thermal problems associated with laser processing die attach tape 184.
申请公布号 WO2011123670(A2) 申请公布日期 2011.10.06
申请号 WO2011US30765 申请日期 2011.03.31
申请人 ELECTRO SCIENTIFIC INDUSTRIES, INC.;OSAKO, YASU;CHO, BONG;FINN, DARAGH;HOOPER, ANDREW;O'BRIEN, JAMES 发明人 OSAKO, YASU;CHO, BONG;FINN, DARAGH;HOOPER, ANDREW;O'BRIEN, JAMES
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