METHOD FOR ROUGHENING SUBSTRATE AND METHOD FOR MANUFACTURING PHOTOVOLTAIC DEVICE

摘要

Disclosed is a method for roughening a substrate, which includes: a step of forming an etching resistant film on the surface of the substrate; a step of attaching a mesh-like blast mask (3) to the etching resistant film; a step of forming, by blast processing, a fine opening (4) in an etching resistant film region having no blast mask (3) attached thereto; a step of removing the blast mask; a step of performing etching using the etching resistant film having the opening formed therein; and a step of removing the etching resistant film.