| 摘要 |
PROBLEM TO BE SOLVED: To reduce the cost of designing and manufacturing a photomask.SOLUTION: A photomask is manufactured in the following apparatus for designing and manufacturing a photomask. The apparatus has: a display means; a process instruction input means; and an improved mask pattern forming means, a wafer transfer simulation means, a wafer transfer feature difference determining means, and an EB drawing pattern number determining means, which are controlled by the process instruction input means. The wafer transfer feature difference determining means creates a pattern feature difference data and displays the data in the display means, wherein the pattern feature difference data represents the difference between a pattern resulting from wafer transfer simulation and a target pattern, and comprises: the minimum dimension data (critical dimension (CD)) of the width of the target pattern; the minimum dimension data (Space) of the space between target patterns, a light intensity gradient data (CD_NILS) in the CD; a light intensity gradient data (Space_NILS) in the Space; a depth of focus data (DOF); and a mask error enhancement factor data (MEEF). |
