发明名称 Structure and manufacturing method of semiconductor memory device
摘要 A semiconductor memory device having a cross point structure includes a plurality of upper electrodes arranged to extend in one direction, and a plurality of lower electrodes arranged to extend in another direction at a right angle to the one direction of the upper electrodes. Memory materials are provided between the upper electrodes and the lower electrodes for storage of data. The memory materials are made of a perovskite material and arranged at the lower electrodes side of the corresponding upper electrode extending along the corresponding upper electrode.
申请公布号 US8030695(B2) 申请公布日期 2011.10.04
申请号 US20100976113 申请日期 2010.12.22
申请人 SHARP KABUSHIKI KAISHA 发明人 OHNISHI TETSUYA;SHINMURA NAOYUKI;YAMAZAKI SHINOBU;SHIBUYA TAKAHIRO;NAKANO TAKASHI;TAJIRI MASAYUKI;OHNISHI SHIGEO
分类号 H01L21/02 主分类号 H01L21/02
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