发明名称 Lithographic method and carrier substrate
摘要 A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
申请公布号 US8029973(B2) 申请公布日期 2011.10.04
申请号 US20080276705 申请日期 2008.11.24
申请人 ASML NETHERLANDS B.V. 发明人 DE LAAT WILHELMUS JOHANNES MARIA;GUI CHENG-QUN;GIESEN PETER THEODORUS MARIA;VAN DIJK PAULUS WILHELMUS LEONARDUS;MEINDERS ERWIN RINALDO;PETER MARIA
分类号 G03F7/00;G03F7/09 主分类号 G03F7/00
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