发明名称 |
Lithographic method and carrier substrate |
摘要 |
A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
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申请公布号 |
US8029973(B2) |
申请公布日期 |
2011.10.04 |
申请号 |
US20080276705 |
申请日期 |
2008.11.24 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DE LAAT WILHELMUS JOHANNES MARIA;GUI CHENG-QUN;GIESEN PETER THEODORUS MARIA;VAN DIJK PAULUS WILHELMUS LEONARDUS;MEINDERS ERWIN RINALDO;PETER MARIA |
分类号 |
G03F7/00;G03F7/09 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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