| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing solution for photolithography, in which tetrabutylammonium hydroxide (TBAH) is used as an alkaline agent of the developing solution and deposition of TBAH is suppressed. SOLUTION: The developing solution for photolithography contains (A) tetrabutylammonium hydroxide, and at least one selected from the group consisting of (B1) alcohol, (B2) a surfactant, and (B3) a clathrate. COPYRIGHT: (C)2011,JPO&INPIT |
