发明名称 Design Structure For Dense Layout of Semiconductor Devices
摘要 A semiconductor structure, and a method of making, includes: a substrate; and at least one layer of silicon overlying the substrate, the layer of silicon including at least one active region having at least one device, a design layout of the active region in accordance with design layout rules including: a multiple-fingered device is mapped to a symmetric device or an asymmetric body-tied device; a single-fingered device is mapped to an asymmetric device; an active region having a single-fingered device is entirely source-up or source-down; and an active region falls into one of two categories: the active region does not include any symmetric devices or the active region does not include any asymmetric devices. In another exemplary embodiment, a design structure tangibly embodied on a computer readable medium, for use by a machine in the design, manufacture or simulation of an integrated circuit having the above semiconductor structure.
申请公布号 US2011233674(A1) 申请公布日期 2011.09.29
申请号 US20100748761 申请日期 2010.03.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 SLEIGHT JEFFREY W.;LIN CHUNG-HSUN;CHANG JOSEPHINE B.;CHANG LELAND
分类号 H01L29/786;G06F17/50;H01L21/336 主分类号 H01L29/786
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