| 摘要 |
<P>PROBLEM TO BE SOLVED: To produce a hardened pattern excellent in chemical resistance even in a process at low temperature and to obtain a high-quality display device etc. even when a low heat-resistant substrate etc. are used by using the method for producing a hardened pattern. <P>SOLUTION: The method for producing the hardened pattern includes the steps of: obtaining a coating film by coating a photosensitive resin composition including a silicon-containing acrylic resin, a siloxane compound, a photosensitive material, and a solvent on a substrate; drying the coating film using at least one method selected from the group consisting of heating or reduction in pressure; exposing the dried coating film via a photomask; heating the exposed coating film at 50-150°C; obtaining a pattern by developing the heated coating film; and obtaining the hardened pattern by heating the pattern at 50-150°C, wherein the solvent includes more than 50 mass% of a hydroxyl group-containing solvent relative to the total amount of the solvent. <P>COPYRIGHT: (C)2011,JPO&INPIT |
