| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. <P>SOLUTION: The lithographic apparatus includes a substrate table configured to support the substrate on a substrate supporting area and including a plurality of heaters 400 and/or temperature sensors 500 arranged adjacently to a center part of the substrate supporting area. The plurality of heaters and/or sensors are elongated in a parallel direction substantially, and extend over the substrate support area from one edge end part to an opposite edge end part. A time when they are under a projection system during a period of imaging becomes shorter than a case where an elongated direction of the heaters and/or sensors are perpendicularly oriented to a first direction. <P>COPYRIGHT: (C)2011,JPO&INPIT |
