INTEGRATED SYSTEM FOR VAPOR GENERATION AND THIN FILM DEPOSITION

摘要

An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.