| 摘要 |
A charged particle beam writing apparatus includes a reading unit to read an identifier (ID) from a substrate where an absorber film which absorbs extreme ultraviolet (EUV) light is formed and the identifier which can be optically read is formed, a storage unit to store defect position information indicating a position of a defect on the substrate based on reference marks, defect size information indicating a size of the defect, which are corresponding to the identifier, and pattern data for writing, an examination unit to input partial pattern data corresponding to a region including at least the defect in the pattern data, the defect position information based on reference marks, and the defect size information, and to examine whether a pattern layout is formed such that the defect is located in a region where the absorber film remains after patterning, and a writing unit to write a pattern on the substrate using a charged particle beam, based on the pattern data in which the pattern layout is formed such that the defect is located in the region where the absorber film remains after patterning. |
