| 摘要 |
PROBLEM TO BE SOLVED: To provide a device which can efficiently clean an oversize vapor deposition mask for an organic EL element and increase the frequency of using the vapor deposition mask. SOLUTION: This cleaning device for vapor deposition mask is of such a constitution that the vapor deposition mask 2 includes a first surface and a second face, a vapor depositing agent being applied to the first surface, and the circumferential side of the first surface of the vapor deposition mask 2 is fitted to a frame part 3 whose thickness is larger than the vapor deposition mask 2. The vapor depositing agent is peeled off the vapor depositing mask 2 by irradiating the first surface with laser beams 10 using a laser exposure means. Then, a cleaning liquid is sprayed to the first surface of the vapor deposition mask 2 with the help of a first cleaning means 6 with a nozzle, and the cleaning liquid to which ultrasonic wave is applied, is sprayed to the second surface of the vapor deposition mask 2 by a second cleaning means 6 with a nozzle. Consequently, the cleaning liquid to which the ultrasonic wave is applied can be sprayed to a spot near the vapor deposition mask 2. Therefore, it is possible to efficiently clean the vapor deposition mask. COPYRIGHT: (C)2011,JPO&INPIT
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