发明名称 PLASMA DOPING METHOD
摘要 Plasma doping is performed using a plasma made of a gas containing an impurity which will serve as a dopant. In this case, at least one of plasma generation high-frequency power and biasing high-frequency power is supplied in the form of pulses.
申请公布号 US2011230038(A1) 申请公布日期 2011.09.22
申请号 US201113051436 申请日期 2011.03.18
申请人 HAYASHI SHIGENORI;KUBOTA MASAFUMI;SASAKI YUICHIRO 发明人 HAYASHI SHIGENORI;KUBOTA MASAFUMI;SASAKI YUICHIRO
分类号 H01L21/263 主分类号 H01L21/263
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