RESIST PATTERN FORMATION DEVICE, RESIST PATTERN FORMATION METHOD, AND WAFER LENS PRODUCTION METHOD

摘要

Disclosed is a resist pattern formation device that is capable of suppressing the removal or partial loss of a necessary resist pattern. The resist pattern formation device (70) is equipped with a rotatable stage (72) upon which a substrate is disposed, a developing solution discharging unit (78) that discharges a developing solution onto the aforementioned substrate disposed on the stage (72), and a gas venting unit (80) that vents gas onto the aforementioned substrate disposed on the stage (72), and is characterized in that, when the aforementioned substrate is disposed on the stage (72) and the developing solution is discharged from the developing solution discharging unit (78) toward the outer edge of the aforementioned substrate, gas is vented from the gas venting unit (80), and the gas flows towards the outer edge from the interior of the aforementioned substrate.