发明名称 |
METHOD FOR PRODUCING SPUTTERING TARGET, AND METHOD FOR MANUFACTURING OPTICAL MEDIUM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a sputtering target capable of enhancing recording reliability of an optical medium. <P>SOLUTION: The optical medium sputtering target has an interference film 24 composed essentially of SiO<SB>2</SB>and ZnO and is formed by the method for producing the sputtering target including: a crushing step for crushing quartz particles in a ball mill provided with a quartz glass vessel and a quartz glass ball; a mixing step for adding ZnO particles into the ball mill after the crushing step and mixing the crushed quartz particles and the ZnO particles in the ball mill to obtain a mixture; and a step for sintering the mixture. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011184724(A) |
申请公布日期 |
2011.09.22 |
申请号 |
JP20100049530 |
申请日期 |
2010.03.05 |
申请人 |
TDK CORP |
发明人 |
KAWAGUCHI YUKIO;IINO MINORU;KURIBAYASHI ISAMU |
分类号 |
C23C14/34;C04B35/453;C23C14/08;G11B7/24;G11B7/254;G11B7/257;G11B7/26 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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