| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment apparatus that reduces sticking of foreign matter on a substrate to improve productivity. SOLUTION: The heat treatment apparatus includes a heating section which heats the substrate stored in a storage chamber, a first temperature detection section which detects temperature nearby the heating section, a second temperature detection section which is located closer to the substrate than the first temperature detection section and detects temperature nearby the substrate, and a control section which performs heating control over the heating section based upon the detected temperature of the first temperature detection section for a predetermined time after the substrate is put in a furnace. COPYRIGHT: (C)2011,JPO&INPIT
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